effect a junction
- effect a junction的基本解釋
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- 更多網(wǎng)絡(luò)例句與effect a junction相關(guān)的網(wǎng)絡(luò)例句 [注:此內(nèi)容來源于網(wǎng)絡(luò)国产三级网片,僅供參考]
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At first, a model of a pair of excitable neurons coupled via gap junction is built by Chay model, the effect of the strength of gap junction on the synchronous oscillation is studied;then, the synchronous oscillations of a 2-D network are also studied;at last, the Lyapunov exponent and phase portrait are utilized in the analysis of nonlinear, the approximate entropy is utilized to measure the complexity.
首先以Chay模型為基礎(chǔ)建立了兩個神經(jīng)元電突觸耦合模型,研究了不同電突觸耦合強度對兩個神經(jīng)元同步振蕩的影響美女视频黄色网;其次18禁止看黄色av,研究了可興奮神經(jīng)元組成的二維網(wǎng)絡(luò)的同步振蕩;最后欧美在线888,應(yīng)用李雅普諾夫指數(shù)和相圖分析了同步振蕩的非線性免费看黄片片,應(yīng)用近似熵分析了同步振蕩的復(fù)雜性。
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The output amplitude of the oscillator is controlled by a junction type field effect transistor,which works as an automatic amplitude regulator.
振蕩器的輸出幅度是用作為幅度控制器的結(jié)型場效應(yīng)管控制的日韩爱色成人片在线观看视频网站。
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A prediction model has been proposed to deal with threshold voltage shift as a function of 1MeV neutron flux and gate oxide thickness, and to deal with room-temperature annealing of threshold voltage shift induced-by 〓Coγ as a function of electric field and gate oxide thickness. The commonness and individuality of MOS device degradation between hot-carrier effect and ionizing radiation were investigated. The dependence of substrate current, gate current and threshold voltage shift due to hot-carrier on gate oxide thickness were simulated with MEDICI-2D simulator. The photocurrents of PN junction and bipolar transistor were studied. Their transient responses on varied bias voltages, pulse durations and absorbed doses were simulated. The influences of NPN base width on base and collector photocurrents were investigated. We also studied 1MeV neutron displacement damage in PN junction, and calculated reverse current leakage under the neutron flux of 2. 67×10〓 per square centimeter. 3 The study of nondestructive screening method for MOS radiation tolerance A theoretical and experimental study of nondestructive screening methods for radiation tolerance of nMOS and pMOS were firstly fulfilled. We determined the informative parameters pertinent to the method and proposed how to deal with experimental data and verify obtained results statistically, as well as make the required steps for nondestructive screening. Based on the experimental data of 180 samples of discrete pMOS devices, the relation between sample quantity and correlation coefficient, screening equation, and other significant results were obtained from the threshold voltage shifts of pre-and post-irradiation samples.
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